EG-DL130  Series of biaxial XY nanostages   dual-axis XY positioning Stage which uses dual linear motors to drive the lower axis and a single linear motor to drive the upper axis.

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EG-DL130 Series of biaxial XY nanostages dual-axis XY positioning Stage which uses dual linear motors to drive the lower axis and a single linear motor to drive the upper axis.

Short Description:

EG-DL130  Series of biaxial XY nanostages

Performance Characteristics

⚫ Integrated dual-axis XY linear motor motion platform

⚫ Driven by linear motors and equipped with high-precision crossed roller guides

⚫ Low side height, minimal Abbe error

⚫ Flatness and straightness throughout the entire stroke less than ±2μm

⚫ Excellent dynamic performance, dynamic following error less than ±30nm at a constant speed of 1mm/s

⚫ Resolution 1nm, bidirectional repeatability ±100nm to ±150nm, positioning accuracy ±250nm to 300nm

⚫ In-situ stability ±4nm (equipped with high-spec gratings and high-performance controllers)

 

 


Product Detail

SPECIFICATION

Product Tags

The EG-DL130XY series is a two-axis integrated nano-positioning platform that utilizes advanced linear motor drive technology combined with a high-precision crossed roller guide design to provide users with superior nanometer-level positioning accuracy and stability.

The DL130XY series boasts a maximum horizontal load of 10kg, a maximum speed of 800mm/s, and a maximum no-load acceleration of 1g. Its compact dual-axis integrated design reduces overall space occupation, facilitating equipment layout in limited spaces and improving space utilization. All strokes feature a compact overall height of only 85mm, allowing for flexible customization based on customer applications. Applicable Scenarios: The EG-DL130XY series dual-axis XY positioning platform features high precision and high dynamic performance, making it suitable for the following scenarios: Semiconductor manufacturing such as photolithography and wafer inspection; Optical component manufacturing and laser processing; Precision machine tools and industrial robots; Applications requiring ultra-precision dynamic error control, such as optical waveguide processing and gene sequencing line scanning; Measurement and inspection, surface roughness detection, and ultra-precision laser processing, requiring nanometer-level positioning accuracy in industrial and research projects.

 

 

 


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  • Model

    EG-DL130XY-60-60

    EG-DL130XY-110-110

    EG-DL130XY-160-160

    Travel

    60mm*60mm

    110mm*110mm

    160mm*160mm

    Accuracy

    ±250 nm

    ±300 nm

    Bi-Re peatability

    ±100 nm

    ±150 nm

    Pitch

    10 arc sec

    12 arc sec

    15 arc sec

    Yaw

    5 arc sec

    6 arc sec

    8 arc sec

    Straightness

    ±1.5 μm

    ±1.75 μm

    ±2 μm

    Flatness

    ±1.5 μm

    ±1.75 μm

    ±2 μm

    Orthogonality

    5 arc sec

    MaximumSpeed①

    800 mm/s

    MaximumA cceleration①

    1.0 g

    Continuous Fo rce

    24.2 N

    Peak Force

    170.4 N

    LoadCa pacity-Horizontal

    10 kg

    Stage Mass(N o Motor) 5.5 kg 7.5 kg 9.1 kg
    Resolution

    1 nm

    MinimumIncremental step②

    4 nm

    InPosition Stability②

    ±4 nm

    Material

    Aluminium

    MTBF

    30,000 Hours

     

     

     

     

    Notes: ① Maximum speed is under no-load conditions and requires an amplifier with appropriate power;

    ② Minimum step size and in-situ stability require high-performance feedback, such as an XC2e or XL2e linear amplifier;

    ③ The default test point position is 25 mm above the platform. This is a single-axis specification. Performance indicators for multi-axis systems depend on the actual load and operating point position;

    ④ Other travel distances can be customized.

     

     

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